ISO 15932:2013 pdf download.Microbeam analysis一Analytical electron microscopy一Vocabulary.
ISO 15932 defines terms used in the practice ofAEM. It covers both general and specific concepts classified according to their hierarchy in a systematic order.
ISO 15932 is applicable to all standardization documents relevant to the practice of AEM. In addition, some parts of this International Standard are applicable to those documents relevant to the practice of related fields (e.g. TEM, STEM, SEM, EPMA, EDX) for the definition of those terms common to them.
NOTE See also the ISO online browsing platform (OBP): https://www.iso.org/obp/ui/
1 Abbreviated terms
AEM analytical electron microscope/microscopy
CBED convergent beam electron diffraction
CCD charge-coupled device
CRT cathode ray tube
EDS energy-dispersive X-ray spectrometer/spectroscopy
EDX energy-dispersive X-ray spectrometer/spectroscopy
EELS electron energy loss spectrometer/spectroscopy
EPMA electron probe microanalysis
FFT fast Fourier transform
FIB focused ion beam
FWHM full width at half maximum
HAADF high-angle annular dark field
HREM high-resolution transmission electron microscope/microscopy
LAADF low-angle annular dark field
MBA microbeam analysis
SE secondary electron
SEM scanning electron microscopy
STEM scanning transmission electron microscope/microscopy
TEM transmission electron microscope/microscopy
2 Definitions of terms used in the physical basis of AEM
2.1
electron optics
science that deals with the trajectory of electrons as they pass through electrostatic and/or electromagnetic fields
[SOURCE: ISO 22493, modified]
2.1.1
electron source
device that generates electrons necessary for forming an electron beam in an electron optical system
2.1.1.1
energy spread
diversity of energy of electrons in the incident beam
[SOURCE: ISO 22493, modified]
2.1.1.2
effective source size
effective dimension of the electron source typically measured at the beam crossover
[SOURCE: ISO 22493, modified]
2.1.2
electron emission
ejection of electrons from the surface of a material under certain excitation conditions
[SOURCE: ISO 22493:2008, 3.1.2]
2.1.2.1
thermionic emission
electron emission which relies on the use of high temperature to enable electrons in the cathode to overcome the work function energy barrier and escape into the vacuum assisted by the application of an external electrostatic field
[SOURCE: ISO 22493, modified]
2.1.2.2
field emission
electron emission caused by the strong electric field on and near the surface of the material
[SOURCE: ISO 22493, modified]
2.1.2.2.1
cold field emission
field emission in which the emission process relies purely on the applied electric field to extract electrons from the cathode operating at ambient temperature
[SOURCE: 150 22493, modified]
2.1.2.2.2
thermal field emission
field emission in which the emission process relies on both the elevated temperature of the cathode tip and an applied electric field of high voltage
[SOURCE: ISO 22493, modified]. ISO 15932 pdf download.