ISO 13424:2013 pdf download.Surface chemical analysis一X-ray photoelectron spectroscopy-Reporting of results of thin-film analysis.
ISO 13424 specifies the minimum amount of information required in reports of analyses of thin films on a substrate by XPS. These analyses involve measurement of the chemical composition and thickness of homogeneous thin films, and measurement of the chemical composition as a function of depth of inhomogeneous thin films by angle-resolved XPS, XPS sputter-depth profiling, peak-shape analysis, and variable photon energy XPS.
2 Normative references
The following documents, in whole or in part, are normatively referenced in this document and are indispensable for its application. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document (including any amendments) applies.
ISO 18115-1:2010, Surface chemical analysis — Vocabulary — Part 1: General terms and terms used in spectroscopy
3 Terms and definitions
For the purposes of this document, the terms and definitions in ISO 18115-1:2010 apply.
4 Abbreviated terms
AES Auger electron spectroscopy
ARXPS Angle-resolved X-ray photoelectron spectroscopy
IMFP Inelastic mean free path
MED Mean escape depth
RSF Relative sensitivity factor
TRMFP Transport mean free path
XPS X-ray photoelectron spectroscopy
5 Overview of thin-film analysis by XPS
5.1 Introduction
XPS analyses of thin films on substrate can provide information on the variation of chemical composition with depth and on film thicknesses. Several XPS methods can be used if the total film thickness is less than three times the largest MED for the detected photoelectrons. The MED for particular photoelectrons is a function of the IMFP and the emission angle of the photoelectrons with respect to the surface normal. The IMFP depends on the photoelectron energy and the material. MED values can be obtained from a database.[1] A simple analytical formula for estimating MEDs has been published for emission angles <=50°.[2] For such emission angles, the MED is less than the product of the IMFP and the cosine of the emission angle by an amount that depends on the strength of the elastic scattering of the photoelectrons in the film.[2] Both the IMFP and the strength versus depend on the chemical composition of the film. The MED is typically less than 5 nm for many materials and common XPS instruments and measurement conditions. If the effects of elastic scattering are neglected, the MED is given approximately by the product of the IMFP and the cosine of the emission angle. The latter estimates of the MED can be sufficient for emission angles larger than 50° although better estimates can be obtained, e.g. from the database.[l] If the total film thickness is greater than three times the largest MED, XPS can be used under certain conditions (see Annex D) together with ion sputtering to determine the variation of chemical composition with depth.ISO 13424 pdf download.